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  • VuVES Exposure Machine
    Can provide exposure wavelength of 193248nm; Determination of photoresist sensitivity and Dill ABC parameters
  • RDA photoresist development analysis instrument
    Calculate and analyze various parameters of photoresist, such as film thickness variation curve, development rate, contrast curve, PEB diffusion length, etc
  • LAB lithography simulation software
    Simulate 3D forming of photoresist; There are multiple exposure modules available: Proximity/Projection/E-Beam/Laser; Powerful process analysis and OPC functions: process window, film thickness optimization, FEM, BARC optimization, etc
VuVES Exposure Machine

测量光刻胶灵敏度

测量透过率以及Dill ABC参数

RDA photoresist development analysis instrument

测量光刻胶灵敏度

测量透过率以及Dill ABC参数

LAB lithography simulation software

测量光刻胶灵敏度

测量透过率以及Dill ABC参数

Adhering to the service oriented direction of Hong Kong Liman Trading Co., Ltd. for over 30 years,following Shenzhen Liman Industrial Co., Ltd. as another important foothold in China
  • Core Business
    Selling and investing in products with technological advantages in the field of micro and nano processing.
  • Company Vision
    Significant contributions have been made in advanced fields such as semiconductors, micro/nano processing, and optical communication. Utilize advanced overseas technologies, equipment, and processes to enhance the quality and speed of domestic development.
Learn more
  • 0510-85850689
  • Room 702, 7th Floor, Sun Yat sen Centre, 27 Cheng Yee Street, Kwun Tong, Kowloon, Hong Kong
  • 1701, 17th Floor, Building 1, 599-1 Jianzhu West Road, Wuxi City, Jiangsu Province
  • Room 1102, Haiwang Xingchen Building, No. 2 Lanxiang 1st Street, Ulan Coast Community, Yuehai Street, Nanshan District, Shenzhen
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