| 光刻胶 | 膜厚[um] 旋涂@3000rpm | 光谱敏感度 | 特点 |
|---|---|---|---|
| EpoCore 2 | 2 | i-line-365nm | 830 nm处的折射率： EpoCore:1.58， EpoClad:1.57， 低收缩率， 热稳定性高达230°C， 850nm时的低光学损耗±0.2dB/cm |
| EpoCore 5 | 5 | ||
| EpoCore 10 | 10 | ||
| EpoCore 20 | 20 | ||
| EpoCore 50 | 50（@1.500rpm） | ||
| EpoClad 2 | 2 | ||
| EpoClad 5 | 5 | ||
| EpoClad 10 | 10 | ||
| EpoClad 20 | 20 | ||
| EpoCore 50 | 50（@1.700rpm） |
Unique features
- Standard UV lithography and PCB technology processing
- UV patterning of core and cladding layers
- High transmittance at 850 nm
- High heat (>230 ° C) and pressure resistance
- Adjustable refractive index (core/cladding)
application
- Optical SM and MM polymer waveguides
- Biosensors (multifunctional systems)
- Microfluidics
Recommended process chemicals for matching use
- Diluent: None
- Developer: Mr. Dev 600 (solvent type)
- Remover: mr-Rem 700 (excluding NMP and NEP), mr-Rem 500 (excluding NMP), O2 Plasma
