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Company Introduction
Adhering to the service oriented direction of Hong Kong Liman Trading Company for over 30 years, following Shenzhen Liman Industrial Co., Ltd., it is another important location in China< The core business is to sell and invest in products with technological advantages in the field of micro and nano processing. Utilize advanced overseas technologies, equipment, and processes to enhance the quality and speed of domestic development< Intended to make significant contributions in advanced fields such as semicon
Company Vision
  • Company Vision
    We are fortunate to be in China, this vast and extremely popular market< We believe that with the right tools, anyone here can completely change any trend, demand, or habit< We are committed to providing the necessary tools in the field of technology
  • Corporate culture
    We are well aware of insignificance and do great things with a humble heart!
    Practice the beauty of becoming a person, reflect and benefit from it.
Product application
MRT /PROFACTOR/ DISCHEM

Application:Micro nano processing, semiconductor process research and development, and process optimization.

Sales target:Colleges, research laboratories, and enterprise research and development departments.

Technology field and industry:The production of optical communication, 5G, optoelectronic integration, compounds, and silicon-based semiconductor devices.

Involving technology:Lithography, nanoimprinting, heated imprinting, electron beam direct writing, laser direct writing

Litho Tech Japan

application:Industry, academia, and research on photoresist and its raw materials.

Sales target:Universities, semiconductor/information technology and electronic chemical/new material research laboratories, and R&D departments of photoresist and its raw material enterprises; Resin manufacturers, composite compounds, and photosensitive material manufacturers.

Technology field and industry: LTJ has been serving the Japanese photoresist industry for decades, using the Mack model created by American photoresist expert Chris Mack to analyze the characteristics of photoresist. The parameters collected using LTJ equipment are not only crucial for the development of photoresist properties, but also for the subsequent simulation and simulation involving technologies such as optics, physics, and chemistry.

GenISys GmbH Software(LAB )

application:Save costs on lithography process design and optimization.

Target Users:Technical research institutes, universities, equipment manufacturers, they are lithography process researchers, designers, etc.

Technology field and industry:Photolithography up to 45nm nodes, E-Beam direct writing, laser direct writing, FPD, photomask, semiconductor, NIL, 5G, manufacturer of nanoscale devices.

Technologies involved:Scanning and stepper exposure, electron beam exposure, laser exposure.

GenISys GmbH Software(ProSEM)

application:Focusing on improving the uniformity, reliability, accuracy, and user friendliness of the use of scanning electron microscopy (SEM).

Target Users:Nanodevice manufacturer, scanning electron microscope operator, nanodevice research institute.

Technology field and industry:E-Beam direct writing, laser direct writing.

Technologies involved:Edge roughness, line width roughness, automatic edge search, multi shape feature measurement, cross-sectional measurement, contour search, batch measurement, one click similarity search.

  • 0510-85850689
  • Room 702, 7th Floor, Sun Yat sen Centre, 27 Cheng Yee Street, Kwun Tong, Kowloon, Hong Kong
  • 1701, 17th Floor, Building 1, 599-1 Jianzhu West Road, Wuxi City, Jiangsu Province
  • Room 1102, Haiwang Xingchen Building, No. 2 Lanxiang 1st Street, Ulan Coast Community, Yuehai Street, Nanshan District, Shenzhen
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