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LITHOTRAC Dual-1000 is a fully automatic spin coating and development equipment independently developed by LTJ company, suitable for small batch production and laboratory research and development. It is equipped with automatic spin coating unit, auto

Product features
实用性广:适用于小批量生产,实验室研究开发用。
操作简单:尽量简易的操作流程,友好的交互界面。
高效率:操作全自动化,只需要简单设置工艺配方即可批量处理晶圆,并行处理。
集成化高:设备高度集成化,稳定性高,维护成本低。
安全性高:配备急停,多种Inter-Lock,硬件检测,软件检测等多重防护。
精准控温:±0.5℃精度。
多种配方任意设置:最多可保存50个配方,每个配方最多可设置30个工序,功能可与大批量生产系统相媲美,是各种加工的理想选择。
兼容多种尺寸的晶圆和方形玻璃衬底:4,6,8,12英寸。(可以定制)
Basic information
设备尺寸及重量※尺寸不含突出部分。

本体 约1,600mm(W)x1,500mm(D)x1,700mm(H);重约:450kg
化学罐柜 约450mm(W)x1,100mm(D)x900mm(H);重约:80kg
温湿度控制器 约440mm(W)x800mm(D)x967mm(H);重约:140kg
真空泵 约230mm(W)x450mm(D)x275mm(H);重约:60kg
系统构成

设备本体 操作面板与机械本体一体吧
含有光刻胶旋转涂布单元和旋转显影单元
涂布单元可控温湿度,带 ULPA 过滤器
收纳药液:含有2个光刻胶药液瓶、HMDS瓶、2个废液桶
HMDS单元
冷板2块
热板3块
晶圆卡夹
上下两个机械臂
温控机
药液箱 外装供药液系统
含有3个20L密封罐,碱性显影液2瓶,稀释济1瓶
温湿度控制器 控制显影单元的温湿度
Equipment operation mode

LITHOTRAC Dual-1000: After placing the wafer on the wafer clamp, click on the control panel to start the device. After vacuum adsorption of the wafer by the dual arm robotic arm, according to the process formula set by the customer, the wafer is transported to various units. A wafer is taken out from the bottom to the top in the order specified by the wafer clamp. It can also be set from which wafer to start working. After processing, the robotic arm places the wafer back in its original position on the wafer clamp.

  • 0510-85850689
  • Room 702, 7th Floor, Sun Yat sen Centre, 27 Cheng Yee Street, Kwun Tong, Kowloon, Hong Kong
  • 1701, 17th Floor, Building 1, 599-1 Jianzhu West Road, Wuxi City, Jiangsu Province
  • Room 1102, Haiwang Xingchen Building, No. 2 Lanxiang 1st Street, Ulan Coast Community, Yuehai Street, Nanshan District, Shenzhen
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