Wide practicality: suitable for small batch production and laboratory research and development.

Easy to operate: try to simplify the operation process and have a friendly interactive interface.

High efficiency: The operation is fully automated, and batch processing of wafers and parallel processing can be achieved by simply setting the process formula.

High Integration: The equipment is highly integrated, with high stability and low maintenance costs.

High safety: equipped with emergency stop, multiple Inter Locks, hardware detection, software detection, and other multiple protections.

Accurate temperature control: ± 0.5 ℃ accuracy.

Multiple formulas can be set arbitrarily: up to 50 formulas can be saved, and each formula can be set up to 30 processes. Its functions can be comparable to those of large-scale production systems, making it an ideal choice for various processing.

Compatible with multiple sizes of wafers and square glass substrates: 4, 6, 8, 12 inches. (Customizable)

LITHOTRAC Dual-1000: After placing the wafer on the wafer clamp, click on the control panel to start the device. After vacuum adsorption of the wafer by the dual arm robotic arm, according to the process formula set by the customer, the wafer is transported to various units. A wafer is taken out from the bottom to the top in the order specified by the wafer clamp. It can also be set from which wafer to start working. After processing, the robotic arm places the wafer back in its original position on the wafer clamp.